Memory State Dynamics in BEOL FeFETs : Impact of Area Ratio on Analog Write Mechanisms and Charging
This work presents dynamic state writing by combining ferroelectric (FE) polarization together with charge injection (CI) on Si-based ferroelectric MOSFETs as a novel approach for non-volatile memory design. FE capacitors are non-destructively integrated in the Back-End-of-Line (BEOL) with Si MOSFETs to create FE-Metal-FETs (FeMFETs). We explore the FE/MOS area ratio (AR) as a critical design para