Ambient pressure x-ray photoelectron spectroscopy study on the initial atomic layer deposition process of platinum
The initial adsorption of MeCpPtMe 3 is investigated using synchrotron-based ambient pressure x-ray photoelectron spectroscopy (XPS). The experiments are done on a native oxide-covered Si substrate. In addition, a reaction with O 2 and the created Pt surface was investigated. Inspiration for the reaction studies was found from atomic layer deposition of metallic Pt, process that uses the same comp