Thin Film Engineering of Indium Tin Oxide: Large area flat panel displays application
Indium Tin Oxide (ITO) thin films with a variety of microstructures were deposited using a large area conventional DC magnetron sputtering system for flat panel displays manufacturing. Highly uniform ITO films with an average thickness of ∼100 ± 3 nm on the ∼0.6 m2 substrate area were obtained. Film structures with small amounts of crystalline sites were produced by room temperature deposition, an