High-performance 15 nm diameter InAs nanowire Ω-gate MOSFETs
In this paper we present 15 nm InAs nanowire lateral MOSFETs with an Ω-gate. The nanowires are grown from size-selected Au-aerosols by means of metal-organic vapor phase epixtaxy (MOVPE). In order to reduce the source and drain resistances, n-type dopants were introduced in the bottom and top parts of the nanowire forming a n-i-n structure. We report experimental data for 15 nm InAs nanowire MOSFE
