Ion irradiation effects during growth of Mo/V(001) superlattices by dual-target magnetron sputtering
Epitaxial (001)-oriented Mo/V superlattice films with wavelengths of ≈ 5 nm have been grown on MgO(001) substrates, kept at 700°C, by dual-target unbalanced magnetron sputter deposition in Ar discharges. Low-energy (15-250 eV) Ar ion irradiation with incident ion-to-metal flux ratio of ≈ 1 during film growth was obtained through the application of a negative potential Vs to the substrate. The effe
