Advanced processing of vertically aligned nanodevices
Lithography technique is highly dependent on the photoresist that is used for the processing of the nanodevices. S1800 series photoresist is probably the most used positive photoresist for UV-lithography process. In this project the electrical and optical properties of the photoresist S1800 are studied in order to find if photoresist could be used as a transparent insulator for photo detectors/sol
