Substrate Control in Fed-Batch Cultivations Using a Model-Based Modification of a PI-Controller
A fedbatch process shows exponential growth under ideal conditions. To obtain good substrate concentration control it is necessary that the regulator can track an exponentially growing feed demand, and standard PI-control has to be supplemented with an estimated basic dosage to get reasonable control. However, an exponentially growing concentration error is impossible to avoid. An I-term could be
