Thermal desorption of oxides on Si(100) : A case study for the scanning photoelectron microscope at Max-Lab
A scanning photoelectron microscope, utilizing a focused beam of monochromatized photons in the energy range from 15 to 150 eV, has been used to study the thermal desorption of oxide layers on Si(100). The instrument can provide high-resolution photoelectron spectra from selected parts of the surface as well as images showing the lateral distribution (on a micrometer scale) of elements in differen