Block Copolymer Lithography. Applications for Sub-50 nm High-Density Nanostructures
As high technology device functionalities seem to constantly be moving towards decreasing critical dimensions and increasing density, there is a need for lithography research to move in the same direction. Block copolymer (BCP) lithography is a promising technique, which has single-digit nanometer resolution, typically has a pattern periodicity of 10-50 nm, and easily scales up the patterned area
