NANOIMPRINT LITHOGRAPHY APPLICATIONS OF METAL ASSISTED CHEMICAL ETCHING OF SILICON
This work describes the Nanoimprint lithography (NIL) applications of metal assisted chemical etching (MaCE) of silicon. One of the main goals of this project is to fabricate NIL stamp using IPS/STU NIL technique in combination with metal assisted chemical etching (MaCE) of Si process. The IPS/STU NIL technique has been used to form Au nanostructures for performing MaCE process. Electron beam lit