Low-temperature growth of boron carbide coatings by direct current magnetron sputtering and high-power impulse magnetron sputtering
B4C coatings for 10B-based neutron detector applications were deposited using high-power impulse magnetron sputtering (HiPIMS) and direct current magnetron sputtering (DCMS) processes. The coatings were deposited on Si(001) as well as on flat and macrostructured (grooved) Al blades in an industrial coating unit using B4C compound targets in Ar. The HiPIMS and DCMS processes were conducted at subst