Area-selective Electron-beam induced deposition of Amorphous-BNx on graphene
Thin, stable and inert dielectric spacers are essential for manufacturing electronic devices based on 2D materials. However, direct synthesis on top of 2D materials is difficult due to their inert nature. In this work, we studied how an electron beam induces fragmentation of borazine and enables spatially confined synthesis of amorphous-BNx on graphene at room temperature. Using a combination of X