Design of solvent vapor annealing tool and study of kinetics of selfassembly of block copolymers for nano-lithography
Block copolymer lithography is a very promising candidate for nanoscale fabrication and is economically viable. It provides a high resolution, inexpensive, and straightforward approach to nano-size patterning. In this thesis, fundamental concepts and theories of block copolymer lithography are introduced. A well-controlled dynamic solvent vapor annealing chamber is built, and the best annealing co
