Defect formation in al-doped SI(100) films grown by molecular-beam epitaxy and solid-phase epitaxy
Aluminium doped Si layers grown either by solid phase epitaxy (SPE) or molecular beam epitaxy (MBE) have been investigated over wide ranges of Al fluxes (J(Al) = 1 x 10(10)-3 x 10(13) cm-2s-1) and growth temperatures (T(s) = 500-900-degrees-C), using RHEED, LEED and AES during growth and cross section TEM of the as-deposited layers. For MBE growth, defect free films could be grown almost in the wh
