Protecting nano-thin oxide layer studied with Alfa Laval
Published 3 May 2020 From the left, Lin Zhu, beamline scientist; Alexei Zakharov, MAXPEEM beamline manager; Axel Knutsson, Material Specialist at Alfa Laval; Oskar Darselius Berg, Alfa Laval. Photo by MAX IV. Through the advanced synchrotron radiation facility MAX IV, senior scientists and materials specialists from NanoLund are contributing to giving Alfa Laval detailed insights of the nanometer
https://www.nano.lu.se/article/protecting-nano-thin-oxide-layer-studied-alfa-laval - 2025-02-19